Two programmable hot plates with vacuum (UniTemp GmbH VHP-210-160)

Programmable 3-stage tube furnace (Carbolite) ​

Atomic layer deposition (Picosun R-200 Advanced) with sources for Aluminum oxide and Hafnium oxide deposition capability) + Ozonator (InUSA AC Series Ozone Generator)

Plasma enhcanved CVD system (Plasmatherm Vision 310 PECVD) with stress control of Si3N4 achieved by using mixed-frequency deposition or low-damage He dilution.

Plasma enhanced CVD system (Vacutec 1500) with in situ optical emission spectroscopy diagnostic technique (Jobin Yvon  Sofie).

Inductively Coupled Plasma Etching system (Oxford Plasma Pro 100 Cobra)