Programmable 3-stage tube furnace (Carbolite) ​

Atomic layer deposition (Picosun R-200 Advanced) with sources for Aluminum oxide and Hafnium oxide deposition capability) + Ozonator (InUSA AC Series Ozone Generator)

Plasma enhcanved CVD system (Plasmatherm Vision 310 PECVD) with stress control of Si3N4 achieved by using mixed-frequency deposition or low-damage He dilution.

Plasma enhanced CVD system (Vacutec 1500) with in situ optical emission spectroscopy diagnostic technique (Jobin Yvon  Sofie).

Inductively Coupled Plasma Etching system (Oxford Plasma Pro 100 Cobra)

Reactive Ion Etching system (Vacutec 1500) with in situ laser interferometry and optical emission spectroscopy end-point detection techniques (Jobin Yvon  Sofie)

RF diode and RF magnetron sputtering system with 3 electrodes. 

Two thermal evaporators  (Home-made) 

UHV e-beam evaporator with an 8 target turret and in situ ion beam cleaning system.