ONE (1) RESEARCH ASSISTANT POSITION IN THE PROJECT IREL40
The deadline to apply for this position has expired.
Publication Date
18/11/2020
Application Deadline
03/12/2020
Position Category
Technical staff
Reference Number
2020_41408
Salary
Location
Herakleion, Crete, Greece
Contact Person
Start Date
01/01/2021
Position Description
Electron Beam Lithography techniques for fabrication of III-nitrides based transistors and MMICs
For the full announcement, follow the link "Related Documents"
Related Project
iRel4.0 - Intelligent Reliability 4.0Required Qualifications
- University Degree in Physical Sciences
- Μaster’s degree in Photonics & Nanoelectronics
- At least five years working experience in micro/nano electronics cleanroom environments
- At least five years working experience in Electron Beam Lithography
Application Procedure
Interested candidates who meet the aforementioned requirements are kindly asked to submit their applications to the address (hr@iesl.forth.gr), with cc to Dr G. Konstantinidis (aek@physics.uoc.gr).
In order to be considered, the application must include:
- Application Form (Form Greek or Form English to the left)
- Brief CV
- Scanned copies of academic titles
Appointment Duration
6 monthsFunding
