Position Description

Electron Beam Lithography techniques for fabrication of III-nitrides based transistors and MMICs

For the full announcement, follow the link "Related Documents"

Related Project

iRel4.0 - Intelligent Reliability 4.0 [6]

Required Qualifications

• University Degree in Physical Sciences 
• Μaster’s degree in Photonics & Nanoelectronics
• At least five years working experience in micro/nano electronics cleanroom environments 
• At least five years working experience in Electron Beam Lithography 

Application Procedure

Interested candidates who meet the aforementioned requirements are kindly asked to submit their applications to the address (hr@iesl.forth.gr [7]), with cc to Dr G. Konstantinidis (aek@physics.uoc.gr [8]).

 

In order to be considered, the application must include:

• Application Form  (Form Greek or Form English to the left)
• Brief CV
• Scanned copies of academic titles

Appointment Duration

6 months