Electron Beam Lithography techniques for fabrication of III-nitrides based transistors and MMICs
For the full announcement, follow the link "Related Documents"
Interested candidates who meet the aforementioned requirements are kindly asked to submit their applications to the address (hr@iesl.forth.gr [7]), with cc to Dr G. Konstantinidis (aek@physics.uoc.gr [8]).
In order to be considered, the application must include:
Links
[1] https://www.iesl.forth.gr/people/konstantinidis-george
[2] https://www.iesl.forth.gr/sites/default/files/formgr.doc
[3] https://www.iesl.forth.gr/sites/default/files/formen.docx
[4] https://www.iesl.forth.gr/sites/default/files/positions/%CE%A9%CE%96%CE%9E%CE%9A469%CE%97%CE%9A%CE%A5-%CE%94%CE%A53%20%282%29.pdf
[5] https://www.iesl.forth.gr/sites/default/files/positions/904%CE%A0469%CE%97%CE%9A%CE%A5-%CE%9C%CE%A5%CE%99.pdf
[6] https://www.iesl.forth.gr/project/irel40
[7] mailto:hr@iesl.forth.gr
[8] mailto:aek@physics.uoc.gr