Publications
Few-photon quantum electrodynamics in a structured continuum
G. M. Nikolopoulos, P. Lambropoulos
J. Opt. B: Quantum Semiclass. Opt., 3, 115, 2001, doi.org/10.1088/1464-4266/3/3/308
Chemical bonding and nanomechanical studies of carbon nitride films synthesized by reactive pulsed laser deposition
P. Papakonstantinou, D.A. Zeze, A. Klini, J. McLaughlin
Diam. Relat. Mater. , 10, 1109, 2001, 10.1016/S0925-9635(00)00498-2
Slice imaging: A new approach to ion imaging and velocity mapping
C.R. Gebhardt, T.P. Rakitzis, P.C. Samartzis, V. Ladopoulos, T.N. Kitsopoulos
Rev. Sci. Instrum. , 72, 10, 3848, 2001, doi.org/10.1063/1.1403010
Ultrafast nonlinear optical response of C60–polystyrene star polymers
E. Koudoumas, M. Konstantaki, A. Mavromanolakis, S. Courisa, Y. Ederle, C. Mathis, P. Setac, S. Leach
Chem. Phys. Lett., 335, 5-6, 533-538, 2001, https://doi.org/10.1016/S0009-2614(01)00088-4
Laser printing of active optical microstructures
G. Koundourakis, C. Rockstuhl, D. Papazoglou, A. Klini, I. Zergioti, N.A. Vainos, C. Fotakis
Appl. Phys. Lett. , 78, 853, 2001, 10.1063/1.1348321
Transient and instantaneous third-order nonlinear optical response of C60 and the higher fullerenes C70, C76 and C84
E. Koudoumas, M. Konstantaki, A. Mavromanolakis, X. Michaut, S. Couris, S. Leach
J. Phys. B: At. Mol. Opt. Phys., 34, 24, 4983, 2001, https://doi.org/10.1088/0953-4075/34/24/302
Modern technology in artwork conservation: a laser-based approach for process control and evaluation
V. Tornari, V. Zafiropulos, A. Bonarou, N.A. Vainos, C. Fotakis
J. Opt. and Lasers in Engineering , 34 , 309-326 , 2000, dx.doi.org/10.1016/S0143-8166(00)00068-3
Beyond single-photon localization at the edge of a photonic band gap
G. M. Nikolopoulos, P. Lambropoulos
Phys. Rev. A, 61, 053812, 2000, doi.org/10.1103/PhysRevA.61.053812
Deposition of carbon nitride films by reactive sub- picosecond pulsed laser ablation
S. Acquaviva, A. Perrone, A. Zocco, A. Klini, C. Fotakis
Thin Solid Films , 373, 266, 2000, 10.1016/S0040-6090(00)01095-6
Induced HSiCl emission in the UV photodissociation of 2-chloroethenylsilane
Rebecade Nalda, Andonis Mavromanolakis, SteliosCouris, Marta Castillejo
Chem. Phys. Lett., 316, 5-6, 449-454, 2000, https://doi.org/10.1016/S0009-2614(99)01313-5

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