• Main Chamber for up to 3" substrates
  • Transfer chamber
  • Entry-outgas chamber
  • K-cells for Ga, Al, In, Si
  • Si sublimation source
  • RHEED 15 KeV system
  • Mass spectrometer 1-200 amu
  • N2 RF plasma source
  • Source alteration possibilities, e.g. gas injector for NH3
Undefined