Submitted by loukakos on Thu, 05/27/2021 - 15:54
This workstation has a dual purpose:
(i) Laser-induced Forward Transfer of thin film spots on a variety of substrates.
(ii) Surface irradiation and micro-/nanoprocessing on a variety of solid surfaces.
The input to this workstation is a Ti:Sapphire laser amplifier at 785 nm, 25 fs, <0.8 mJ per pulse and its secondary sources.
Undefined
