The lab was recently (2015) launched to cover the needs of the activity. The clean room ensures stable Temperature / Humididty environment and is separated in three zones:

Zone 1: General processing

The main target if this zone is to enable hands on access to students (starting from undergraduate) to perform hand on work using basic equipment. This zone is equped with a solvent wet bench, spin coating and hotplates, optical microscopy and profilometry.

Zone 2: RF Characterization

This zone hosts a series of Temperature / humidity sensitive equipment such as RF characterization, a custom Electrical Impedance spectroscopy setup and other characterization tools shown below)

Zone 3: Nanoparticles & 2D growth and manipulation

The last zone focuses on nanoparticle handling (2 nanoparticle tolerant wet benches/hoods with exhaust filtration), a custom made Langmuir Blodgett system, a series of sonicators, precision scales, inert atmosphere glove box, and ovens

In this zone the 2D dual CVD growth system is also placed (Graphenes and Transition metal dichalcogenides)

For information or to request access to the lab please contact George Deligeorgis