Published on IESL-FORTH (https://www.iesl.forth.gr)

A novel physical vapor deposition setup applying high-frequency currents: Deposition of Cu thin films

English
Ioannis A Poimenidis, Michalis Liapakis, Argyro Klini, Maria Farsari, Stavros D Moustaizis, Michalis Konsolakis, Panagiotis A Loukakos
232
113839
1/2/2025
https://doi.org/10.1016/j.vacuum.2024.113839
Journal
Elsevier, Vacuum