Plasma enhcanved CVD system (Plasmatherm Vision 310 PECVD) with stress control of Si3N4 achieved by using mixed-frequency deposition or low-damage He dilution.
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Published on IESL-FORTH (https://www.iesl.forth.gr)
Plasma enhcanved CVD system (Plasmatherm Vision 310 PECVD)
Submitted by waliakon on Mon, 06/20/2022 - 12:21